X ROTARY ANODE

专利摘要:
The present invention relates to an X-ray rotary anode (10) which has a carrier body (14) and a focal path (16) formed on the carrier body (14). The carrier body (14) and the focal path (16) are produced by powder metallurgy in a composite, the carrier body (14) is formed from molybdenum or a molybdenum-based alloy, and the focal lane (16) is formed from tungsten or a tungsten-based alloy. In the case of the finally heat-treated x-ray rotary anode (10), at least one section of the focal track (16) is present in a non-recrystallized and / or in a partially recrystallized structure.
公开号:AT12494U1
申请号:TGM34/2011U
申请日:2011-01-19
公开日:2012-06-15
发明作者:Johann Eiter；Juergen Schatte；Wolfgang Glatz；Wolfram Knabl；Gerhard Leichtfried；Stefan Schoenauer
申请人:Plansee Se；
IPC主号:

专利说明:

Austrian Patent Office AT12 494 U9 2012-09-15
description
X ROTARY ANODE
The present invention relates to an X-ray rotary anode, which has a carrier body and a formed on the carrier body focal path, wherein the carrier body and the focal path are produced by powder metallurgy in the composite, the carrier body is formed of molybdenum or a molybdenum-based alloy, and the Firing track is formed of tungsten or a tungsten-based alloy.
X-ray rotary anodes are used in X-ray tubes for generating X-rays. In use, electrons are emitted from a cathode of the x-ray tube and accelerated in the form of a focused electron beam onto the rotated x-ray rotating anode. Much of the energy of the electron beam is converted into heat in the X-ray rotary anode, while a small portion is emitted as X-radiation. The locally released amounts of heat lead to a strong heating of the X-ray rotary anode and to high temperature gradients. This leads to a heavy load on the X-ray rotary anode. The rotation of the X-ray rotary anode counteracts overheating of the anode material.
Typically, X-ray rotary anodes have a carrier body and a coating formed on the carrier body, which is specially designed for the generation of X-rays and is referred to in the art as a focal path on. The carrier body and the focal track are formed of refractory materials. As a rule, the focal track covers at least the region of the carrier body which is exposed to the electron beam during use. In particular, materials with a high atomic number, such as tungsten, tungsten-based alloys, in particular tungsten-rhenium alloys, etc., are used for the focal path. Among other things, the carrier body must ensure effective heat dissipation of the heat released at the point of impact of the electron beam. As suitable materials (with high thermal conductivity), in particular molybdenum, molybdenum-based alloys, etc., have proven useful here. A proven and relatively inexpensive manufacturing process is powder metallurgy production, in which the carrier body and the focal track are produced in a composite.
For a high radiation yield or dose yield (to X-radiation) is essential that the surface of the focal track is as smooth as possible. In view of the long-term use behavior and the achievable life, the focal track should be as stable as possible against a roughening of the focal point surface and the formation of wide and / or deep cracks in the same. Due to the high temperatures and temperature gradients as well as the high rotational speeds, relatively high thermal and mechanical stresses occur on the carrier body. Despite these stresses, the carrier body should be as stable as possible against macroscopic deformations. So far, the prevailing view has been that this stability can be obtained both in the focal lane and in the carrier body in that both the focal lane and the carrier body are present in a completely recrystallized structure. It was assumed that in this way the structure of the focal track as well as the structure of the carrier body are largely stable to subsequent microstructural changes (for example, to recrystallization, etc.) even at the high temperatures used.
However, occurring in the context of the previous powder metallurgical production recrystallization in the focal path leads to relatively large particle sizes. Such structures involve the risk of forming relatively deep and wide cracks which preferentially spread along the grain boundaries. Further, with large grain sizes, there is a greater tendency for relatively rough roughening of the focal surface to occur over the period of use. A recrystallized structure in the carrier body causes the strength and hardness thereof to be reduced. In particular at high temperatures and under high mechanical loads, a plastic deformation of the carrier body (in particular when the yield stress is exceeded) can then occur (in particular, AT12 494 U9 2012-09-15). Particularly in the high-power range, in which a high dose rate (or radiation power) can be provided and the rotational speed of the x-ray rotary anode is comparatively high, these critical values are in part exceeded. Due to the reduced heat resistance of the (completely recrystallized) carrier body material, the possible uses of X-ray rotary anodes with completely recrystallized structure of the carrier body are accordingly limited. So far, for applications in which a high strength and hardness of the carrier body is required even at high temperatures, special alloys and / or materials, which atomic or particulate impurities are added to increase the strength used (see, for example, US 2005/0135959 A1).
US Pat. No. 6,487,275 B1 describes an X-ray rotary anode with a Wofram-Rhenium alloy focal track which has a grain size of from 0.9 gm to 10 gm and which is produced as part of a CVD coating process (CVD: Chemical vapor deposition ; German: Chemical vapor deposition) can be produced.
Accordingly, the object of the present invention is to provide a powder metallurgically produced in the composite X-ray rotary anode, which allows a high dose yield over long periods of use and has a long service life.
The object is achieved by an X-ray rotary anode according to claim 1. Advantageous developments of the invention are specified in the subclaims.
According to the present invention, there is provided an X-ray rotary anode which has a support body and a focal path formed on the support body. In this case, the carrier body and the focal path are produced by powder metallurgy in a composite, the carrier body is formed from molybdenum or a molybdenum-based alloy, and the focal lane is formed from tungsten or a tungsten-based alloy. In the finally heat-treated x-ray rotary anode, at least a portion of the focal path is present in a non-recrystallized and / or in a partially recrystallized structure.
By at least a portion of the focal path is present in a non-recrystallized and / or in a partially-recrystallized structure, this section has no, resulting from Kornneubildung crystal grains (in the case of a non-recrystallized structure) or only in a proportion of well below 100 % by Kornneubildung resulting crystal grains (partially recrystallized structure) on. The remaining portion of this section is present in a forming structure, which is obtained in the powder metallurgy production by the forming step, in particular by the forging process. Overall, in the portion having the non-recrystallized and / or partially recrystallized structure, a very fine-grained structure (both large-angle grain boundary and wide-angle grain boundary portions and small-angle grain boundaries) having high strength and hardness is obtained. This structure has a very smooth surface, which is advantageous in terms of dose yield. It has been found that this structure recrystallizes locally under the action of an electron beam (for example during "conditioning" or "retraction" with the electron beam, and / or during use). The region in which recrystallization takes place is limited to the immediate vicinity of the path of the electron beam on the focal path and, depending on the thickness of the focal path, can extend down into the carrier body (and possibly into it). The refractory path then has in the recrystallized region an increased ductility, which is advantageous with regard to the prevention of cracking, and an increased thermal conductivity, which is advantageous with regard to an effective heat dissipation to the carrier body. The surrounding areas of the focal track remain largely unchanged. In particular, they are still present in a non-recrystallized and / or a partially recrystallized structure and accordingly have a high strength and hardness. This is advantageous in terms of stabilization of the recrystallized region of the focal path. Furthermore, it has surprisingly been found that the locally recrystallized structure of the focal track (in use) remains considerably finer grained than in the case of the recrystallization processes in the context of the conventional production methods, in particular of the German patent application WO 94/12545 conventional powder metallurgical manufacturing process is the case. The focal track surface is also smooth in the areas with the recrystallized structure over long periods of use and has a uniform, finely distributed crack pattern. Accordingly, with the X-ray rotary anode according to the invention over long periods of use a high dose yield can be achieved. Furthermore, it has a long service life. A possible explanation for the fine-grained formation of the recrystallized structure of the focal path under the action of the electron beam is that a shock-like transformation takes place by the action of the electron beam. In contrast, it has been found that in the heat treatment carried out in the context of conventional powder metallurgical production, even during heating in the furnace, until the holding temperature is reached, recovery processes take place which influence the recrystallization behavior.
With a certain composition of the focal path, a higher starting hardness (and a higher starting strength) can be obtained with increasing degree of deformation (which is set in the step of forming, especially the forging). From this starting hardness (and starting strength), the hardness (and strength) decreases with the degree of recrystallization of the structure. As the degree of recrystallization increases, ductility also increases. The preferred texturing of the < 111 > and the < 001 > direction perpendicular to the focal plane is shown below in relation to a further embodiment in particular by the forging process (with a force acting substantially perpendicular to the focal track Level is set). It has also been found that even this preferred texturing decreases with the degree of recrystallization of the structure. Corresponding relationships also apply to the carrier body. From these dependencies, the person skilled in the art recognizes how to select the parameters of the powder metallurgy production (in particular the temperature during forging, degree of deformation in the forging process, temperature during the heat treatment, duration of the heat treatment) in order to achieve the features specified in accordance with the invention to get at least a section of the focal track. In the present context, a partially recrystallized structure (with respect to the focal path and with respect to the carrier body) is understood to mean a structure in which grain grains formed by grain remodeling are surrounded by a forming structure and in which a cross-sectional area through the part Recrystallized structure these crystal grains form an area ratio in the range of 5-90%. If the area fraction of the crystal grains formed by grain regeneration is in the range below 5% or if there are no crystal grains formed in the structure by grain nucleation, an unrecrystallized structure is assumed in the present context. If the area fraction exceeds 90%, then in the present context a completely recrystallized structure is assumed. A possible measuring method suitable for determining the area ratio is given below in connection with the description of FIGS. 4A-4D.
The X-ray rotary anode according to the invention is in particular a high-performance X-ray rotary anode, which is designed for a high radiation power (or dose rate) and a high rotational speed. Such high-power X-ray rotary anodes are used in particular in the medical field, such as in computed tomography (CT) and in cardiovascular applications (CV). In general, further layers, add-on parts, etc., such as a graphite block, etc., may also be provided on the carrier body, in particular on the side remote from the focal point. In the case of high-performance x-ray rotary anodes, additional heat removal from the carrier body is generally required. In particular, the inventive X-ray rotary anode is designed for active cooling. In this case, immediately adjacent to or in the vicinity of the carrier body, in particular centrally through the X-ray rotary anode (for example through a channel running along the axis of rotation of the rotation axis), a flowing fluid is passed which serves to dissipate heat from the carrier body. Alternatively, to increase the heat storage capacity of the X-ray rotary anode and to increase the heat radiation, a graphite body (for example, by soldering, diffusion bonding, etc.) may be applied to the back of the carrier body. Alternatively, however, the X-ray rotary anode can also be designed for lower radiation powers. In this case, it may be possible to dispense with an active cooling and the attachment of a graphite block.
With a molybdenum-based alloy is particularly referred to an alloy containing molybdenum as the main component, i. to a higher proportion (measured in weight percent) than any other containing element. In particular, special alloys with high strength and hardness can also be used as the carrier body material and / or atomic impurities or particles can be added to the respective carrier body material to increase the strength. According to a development, the molybdenum-based alloy has a proportion of at least 80 (wt.%: Weight percent) molybdenum, in particular of at least 98 wt.% Molybdenum. With a tungsten-based alloy is particularly referred to an alloy having tungsten as the main component. In particular, the focal track is formed from a tungsten-rhenium alloy having a rhenium content of up to 26 wt.%. In particular, the rhenium content is in a range of 5-10 wt.%. Good properties can be achieved with regard to hardness, temperature resistance and heat conduction in the case of these stated compositions of the focal track and of the carrier body and especially in the narrower regions specified in each case.
Under a "final heat treated x-ray rotating anode". is understood to have passed through all the heat treatments carried out in the context of powder metallurgical production). The claimed features (and also the features explained below with reference to the subclaims and variants) relate in particular to the end product (not yet used), as it is present after completion of the heat treatment (s) carried out as part of the powder metallurgical production , The powder metallurgy production of the carrier body and the fuel track in the composite can be seen on the end product, inter alia, at the pronounced diffusion zone between the carrier body and the focal track. In alternative production methods, such as, for example, when applying the focal path by means of CVD (CVD: Chemical vapor deposition) or by means of vacuum plasma spraying, the diffusion zone is typically smaller or almost non-existent. With the "section " Specifically, the focal track is referred to a macroscopic contiguous portion (i.e., including a plurality of grain boundaries and / or grain boundary portions) of the focal track. It can also be several, such sections with the claimed properties. In particular, the portion of the focal path over which (in use) the path of the electron beam passes has the claimed properties. In particular, the focal track over its entire area on the claimed properties. With a "non-recrystallized and / or partially recrystallized structure". reference is made to a structure which can not be exclusively recrystallized, which can be exclusively partially recrystallized, or which can not be partially recrystallized in sections and partially recrystallized in sections.
According to a further development, the section of the focal track perpendicular to a focal plane level has a preferred texturing of the <111> direction with a texture coefficient TC (222) of> x, which can be determined via X-ray diffraction (XRD: X-ray diffraction) ; 4 and preferential texturing of the &lt; 001 &gt; direction with an X-ray diffraction determinable texture coefficient TC (2oo) of &gt; 5 (with I (hU) _ Σ "= ι / 7 * (ΛΗ)" 7ö) where l (hki) is the measured intensity of the peak (hkl), l ° (hki) is the texture-free intensity of the peak (hki) hkl) according to the JCPDS database, and n is the number of evaluated peaks, the following peaks being evaluated: (110), (200), (211), (220), (310), (222), and (321)). Accordingly, in the focal path, the <111> direction and the <001> direction are aligned more along the normal of the focal plane than along the directions parallel to the focal plane. The "focal plane level" is determined by the main extension surface of the focal track. If the focal plane is curved (which is the case, for example, in the case of a frustum-shaped focal path), reference is made to the main extension surface present in the respective measuring or reference point of the focal track.
As explained above, the preferential texturing of the <111> direction and the <001> direction perpendicular to the focal plane is set by the forging operation and decreases with increasing degree of recrystallization of the focal path. The degree of recrystallization in turn increases with increasing temperature and with increasing duration of the heat treatment (at and / or after forging). Accordingly, the stated texture coefficients are also a measure of the degree of recrystallization of the focal track. In particular, the higher the texture coefficients of these directions, the lower the degree of recrystallization of the focal track. Within the ranges of the texture coefficients specified according to this development, the section of the focal track is present in a non-recrystallized structure or in a partially recrystallized structure with a relatively low degree of recrystallization. It was found that within these ranges, the above-explained, advantageous properties (high hardness, fine graininess) of the focal path can be achieved, with these advantageous properties occur even more at even higher texture coefficients. According to a development, the section of the focal track perpendicular to the focal plane has a texture coefficient TC (222) of &gt; 5 and / or a texture coefficient TC (20o) of &gt; 6 on. If the degree of deformation is lower (for example only in the range of 20% -30% (total) degree of deformation of the x-ray rotary anode), then the preferred texturisations given above are also less pronounced. According to a development, the section of the focal track perpendicular to the focal plane has a texture coefficient TC (222) of &gt; 3.3 and / or a texture coefficient TC (2oo) of &gt; 4, wherein the range of these lower limits is approximated in particular at relatively low degrees of deformation.
Tungsten and tungsten based alloys have a cubic internal centered crystal structure. With the directions in the square parentheses &lt; ... &gt; is also referred to the equivalent directions. For example, the &lt; 001 &gt; direction besides the [001] direction also includes the directions [001], [010], [002], [200], and [100] (with respect to a cubic-centered unit cell, respectively). The parenthesized symbols (...) are used to denote lattice planes. The peaks evaluated in the XRD measurement are each designated with the associated network levels (for example, (222)). Again, it should be noted that, as is known in the art, the peak that can be evaluated in the context of the XRD measurement to the network level (222) is also weighted by the equivalent network levels (e.g., (111), etc.). Accordingly, the intensity of the peak (222) determined by XRD measurement, and in particular the texture coefficient TC (222) derived therefrom, is a measure of the preferential texturing of the <111> direction (perpendicular to the focal plane). Similarly, the intensity of the peak (200) determined by XRD measurement, and in particular the texture coefficient TC (20o) determined therefrom, is a measure of the preference texturing of the <001> direction.
The texture coefficient was calculated in each case according to the following formula: l (hkl) '(222) TC (hkl) - ΣΜ. by e.g. for TC (222): 7 ^ (222) _ Σ &quot; i hm) l (hkl) '(222)
yn f0 ^ j = 1 lK
Km rU j = i1 Km Here, l (hki) denotes the intensity of the respective peak (hkl), determined by XRD measurement, at which the texture coefficient TC (hki) is to be determined. As "certain intensities", AT & T 4912U9 2012-09-15 did &quot; of a peak (hkl), the maximum of the respective peak (hkl), as recorded in the XRD measurement, must be used. In the determination of the respective texture coefficient TC (hki), in the sum over lj (hk |) from j = 1 to n, the following intensities of the peaks (110), (200), (211), (X1) determined by XRD measurement are determined. 220), (310), (222), and (321) (ie: n = 7). L ° (hki) denotes the (normally normalized) texture-free intensity of the relevant peak (hkl) at which the texture coefficient TC (hki) is to be determined. This texture-free intensity would be present if the material in question has no texturing. In a corresponding manner, in the sum over l ° j (hk |) of j = 1 to n, the texture-free intensities of these seven peaks are summed up. The texture-free intensities for the respective peaks can be taken from databases, with the data in each case being used for the main constituent of the relevant material. Accordingly, in the present case, the powder diffraction file for tungsten (JCPDS No. 00-004-0806) was used for the focal line. In particular, for the peak (110) the texture-free intensity 100, for the peak (200) the texture-free intensity 15, for the peak (211) the texture-free intensity 23, for the peak (220) the texture-free intensity 8, for the peak ( 310) uses the texture-free intensity 11, for the peak (222) the texture-free intensity 4 and for the peak (321) the texture-free intensity 18.
[0021] Hereinafter, a sample preparation and a measuring method used herein will be described for determining the intensities of the various peaks by X-ray diffraction. First, the track is ground so that the area of the forging zone (upper portion of the track which was in direct contact with the forging tool or in close proximity to the forging tool during the forging process) is removed, if not already complete in the finished X-ray rotary anode was removed. In particular, the focal track with a ground plane parallel to the focal plane is ground to a residual thickness of 0.1-0.5 mm (depending on the output thickness of the focal track). Subsequently, the obtained ground surface is electropolished several times, at least twice (to remove the deformation structure due to the grinding process). While performing the XRD measurement, the sample was rotated and excited to diffract over an area about 10 mm in diameter. To perform the XRD measurement, a theta-2 theta diffraction geometry is used. In the present case, the diffracted intensities were measured in an overview recording with 0.020 ° increment and with 2 seconds measurement time per measured angle. As X-ray radiation, Cu-Ka1 radiation having a wavelength of 1.5406 A was used. The additional effects which occur due to the additionally present Cu-Ka2 radiation in the received image were eliminated by an appropriate software. Subsequently, the maxima of the peaks are determined to the seven peaks specified above. In the present case, XRD measurements were made with a Bragg Brentano diffractometer "D4 Endeaver". performed by Bruker axs with a theta-2 theta diffraction geometry, a Göbel mirror and a Sol-X detector. However, as known in the art, another device may be used with appropriate settings such that comparable results are achieved.
Molybdenum and molybdenum-based alloys also have a cubic-centered crystal structure. Accordingly, the notations discussed above with respect to the focal path, the texture coefficient determination formula, the sample preparation, and the measurement method are respectively applicable. In the context of the sample preparation, in contrast to the method explained above, the X-ray rotary anode is ground down to the carrier body material, the ground surface extending parallel to the focal plane. For the texture-free intensities in the support body, the Powder Diffraction File for molybdenum (JCPDS No. 00-042-1120) was used. In particular, for the peak (110) the texture-free intensity 100, for the peak (200) the texture-free intensity 16, for the peak (211) the texture-free intensity 31, for the peak (220) the texture-free intensity 9, for the peak ( 310) uses the texture-free intensity 14, the texture-free intensity 3 for the peak (222) and the texture-free intensity 24 for the peak (321). According to a development is at the portion of the focal path perpendicular to the 6/25 Austrian Patent Office AT12 494U9 2012-09-15
Trajectory level following relationship of the X-ray diffraction determinable texture coefficients T0 (222) and TC (310) satisfies: TC (222) &gt; This ratio describes how much the peak (222) is broadened or smeared out. If the peak (222) is heavily smeared out, this also increases the intensity of the (adjacent) peak (310) and thus reduces the value of the ratio. Accordingly, the larger the ratio, the less severely the peak (222) is smeared out. It has been found that in the inventive X-ray rotary anodes in which the section of the focal track is present in a non-recrystallized and / or in a partially recrystallized structure, this ratio is significantly higher than in conventional powder metallurgically produced in combination X-ray rotary anodes. In particular, this ratio decreases with increasing degree of recrystallization. Accordingly, this ratio is a characteristic of the focal length, wherein at higher values of this ratio, the above-described, preferred properties (fine grain, low roughening) of the focal path are present in particular. In particular, this ratio is &gt; 7. However, if the degree of deformation is low, this ratio may also be lower than 5. In particular, this ratio is &gt; 4 or &gt; 3.5, the range of these lower limit values being achieved, in particular, in the case of low-conversion x-ray rotary anodes (for example with a (total) degree of deformation in the range of 20-30%). Nevertheless, these lower limits are higher than conventional X-ray anodes produced by powder metallurgy in a composite.
According to a development, the section of the focal track has a hardness of &gt; 350 HV 30 on. As explained above, such high hardness is particularly advantageous with respect to avoiding roughening and / or deformation of the focal track over its service life. In the case of the hardness data made in the context of this description, reference is made in each case to a determination of hardness according to DIN EN ISO 6507-1, wherein in particular a load application time of 2 seconds (according to DIN EN ISO 6507-1: 2 to 8 seconds) and an exposure time or Load holding time of 10 seconds (according to DIN EN ISO 6507-1: 10 to 15 seconds) are to be used. A deviation from this load application time and exposure time can affect the measured value obtained, in particular in the case of molybdenum and molybdenum-based alloys. The hardness measurement (both in the focal path and in the carrier body) is carried out in particular on a radial, perpendicular to the focal plane plane extending cross-sectional area of the X-ray rotary anode.
According to a development of the section of the focal path is completely in a partially-recrystallized structure. In particular, the entire focal track is completely in a partially recrystallized structure. According to a further development, crystal grains formed in the partially recrystallized structure by grain regeneration are surrounded by a forming structure and these crystal grains have an area fraction in the range of 10% to 80%, in particular in a range of 10%, based on a cross-sectional area through the partially recrystallized structure 20% to 60%. Within these areas, and in particular within the narrower range, it was possible to achieve good properties of the focal track with respect to its surface quality and dose yield, even over long periods of use. The method for determining the area ratio which can be used for the stated value range is explained with reference to the figures (see in particular the description of the figures relating to FIGS. 4A-4D). As an alternative to the developments explained above, provision can also be made for the section or possibly also the entire focal track to be present in a non-recrystallized structure. According to a further development, in general (irrespective of whether the section is present in a partially recrystallized and / or in a non-recrystallized structure), it is provided that the area fraction (the crystal formed by grain regeneration can be granulated) &lt; 80%, in particular &lt; 60% is.
In accordance with a further development, the section of the focal point has a mean small-angle separation of &lt; 47/95. 10 pm up. Here, the mean small angle grain boundary distance can be determined by a measuring method in which grain boundaries, grain boundary portions and small angle grain boundaries having a grain boundary angle of &gt; &gt; &gt; at a radial cross-sectional area perpendicular to the focal plane in a portion of the portion of the focal line. 5 °, for determining the average small-angle grain boundary distance parallel to the focal plane in the resulting grain boundary pattern, a line parallel to the cross-sectional area extending from each parallel to the focal plane extending lines, each with a distance of 17 each , 2 pm, the distances between in each case two mutually adjacent intersection points of the respective line with lines of the grain boundary pattern are determined on the individual lines and the mean value of these distances is determined as a mean small-angle grain boundary distance parallel to the focal plane; for determining the average Kleinwin- kel grain boundary distance perpendicular to the focal plane in the grain boundary pattern obtained, a parallel to the cross-sectional area extending line of each perpendicular to the focal plane extending lines, each with a distance of 17.2 pm each In each case, the distances between in each case two mutually adjacent intersection points of the respective line with lines of the grain boundary pattern are determined and the mean value of these distances is determined as a mean small-angle grain boundary distance perpendicular to the focal plane, and the mean Small angle grain boundary distance is determined as the geometric mean of the mean small angle grain boundary distance parallel to the focal plane and the mean small angle grain boundary distance perpendicular to the focal plane. Further details on the implementation of the measuring method are given in the description of FIGS. 4A-4D. Such a fine-grained structure having a mean low angle grain boundary distance of &lt; 10pm is particularly advantageous in view of the prevention of roughening of the focal surface. This fine granularity of the structure also depends on the degree of deformation.
Accordingly, especially at a high degree of deformation of the X-ray rotary anode, a low, medium small-angle grain boundary distance can be achieved. In particular, the average small-angle grain boundary distance according to a development &lt; 5 pm. At a low degree of deformation of the X-ray rotary anode, the small angle grain boundary distance is slightly higher. In particular, according to a further development &lt; 15 pm, and even this higher limit is still lower than the corresponding value for conventional powder metallurgically bonded X-ray anodes.
A characteristic of whether and to what extent a substructure exists is the ratio of the mean (large angle) grain boundary distance (ie, grain boundary angle of> 15 °) to the mean (small angle) grain boundary distance (ie, grain boundary angle of &gt; 5 °). The higher this ratio, the lower the degree of recrystallization. According to a further development, this ratio is &gt; 1.2. In particular, the ratio of &gt; 1.5, more preferably &gt; Second
According to a further development, the section of the focal path in directions parallel to the focal plane has a preferential texturing of the <101> direction. In this case, the higher the preferential texturing of the <101> direction in these directions parallel to the focal plane, the lower the degree of recrystallization of the focal track. The ratio of the preferential texturing of the <101> direction in the directions parallel to the focal plane with respect to the preferential texturing of the <111> and the <001> directions can be determined by means of an EBSD analysis ( EBSD: Electron Backscatter Diffraction). By EBSD analysis, preferential texturing and EBSD texture coefficients can be determined both in directions parallel to the focal plane and perpendicular to the focal plane, with only one sample surface (eg, a cross-sectional area as shown in FIG is shown) must be examined. The sample preparation and the measuring method are generally explained with reference to Figs. 4A-4D, wherein the details for the determination of the EBSD texture coefficient (in particular the exact processing of the measured values) are not discussed , Even without specifying the exact determination method of the EBSD texture coefficients, it is possible to obtain information about the characteristics of the preferred texturing in the different directions (perpendicular as well as parallel to the focal plane) from the comparison of the different EBSD texture coefficients. Here, in a sample according to the invention perpendicular to the focal plane plane for the <111> direction, an EBSD texture coefficient of 5.5 and for the <001> direction an EBSD texture coefficient of 5.5 was determined. Parallel to the focal plane, this EBSD texture coefficient of 2.5 in the radial direction (RD) for the <110> direction and an EBSD in the tangential direction (TD) for the <110> direction Texture coefficient of 2.2. Accordingly, it can be noted that the preferential texturing of the <110> direction (or <101> direction) is less pronounced in directions parallel to the focal plane, and in particular less than half as pronounced the preferred textures of the <111> direction and the <001> direction perpendicular to the focal plane (this was confirmed by further samples).
According to a development, the focal path has a thickness (measured perpendicular to the focal plane) in the range of 0.5 mm to 1.5 mm. In use, in particular, a thickness in the range of about 1 mm has been proven. According to a development, the focal track and / or the carrier body has a relative density of &gt; 96%, in particular of &gt; 98% (relative to the theoretical density), which is particularly advantageous in terms of material properties and heat conduction. The density measurement is carried out in particular according to DIN ISO 3369.
According to a development (in the finally heat-treated X-ray rotary anode) at least a portion of the carrier body in a non-recrystallized and / or in a partially-recrystallized structure. It has been found that a carrier body with these features has a high stability against macroscopic deformations in comparison with carrier bodies with a recrystallized structure, in particular under high mechanical loads. Such carrier bodies are particularly well-suited for actively cooled X-ray rotary anodes, in which the temperature of the carrier body (or at least large portions thereof) can be kept within a range below the recrystallization threshold due to the active cooling. Furthermore, such carrier bodies are also very well suited for lower ranges of radiant power (so-called mid and low end range). If a graphite body is to be attached to the back of the support body, it is preferably mounted (for example by means of diffusion bonding) in such a way that heating of the support body (or parts thereof) via its recrystallization threshold is avoided. Because, according to the present invention, the focal path is present at least in sections in a non-recrystallised and / or partially recrystallized structure, the carrier body can also be inexpensively and simply in a non-recrystallized and / or in a partially recrystallized manner within the scope of powder metallurgical production. recrystallized structure are produced. According to a development, the section of the carrier body has a hardness of &gt; 230 HV 10, in particular of &gt; 260 HV 10 on. These regions are advantageous in terms of high stability of the carrier body against macroscopic deformations, wherein in the region of higher hardness is given a particularly high stability.
According to what has been described above with respect to the focal path, there are also interdependencies in hardness, degree of deformation, degree of recrystallization and ductility in the support body (for a given composition thereof). From these dependencies it results for a person skilled in the art how to choose the parameters of the powder metallurgical production (in particular the temperature during forging, degree of deformation in the forging process, temperature during the heat treatment, duration of the heat treatment) for the respective composition of the carrier body Reference to the carrier body specified characteristics in at least a portion of the same. With "section &quot; of the support body is particularly applied to a macroscopic, contiguous portion (i.e., a plurality of grain boundaries and / or an Austrian Patent Office AT12 494 U9 2012-09-15
Grain boundary sections comprising) of the support body. It can also be several, such sections with the claimed properties. In particular, the carrier body has over its entire area the respective claimed properties.
Another advantage of this development is that classic materials and combinations of materials can be used for the carrier body, which is particularly advantageous in terms of manufacturing costs and costs. The use of special alloys and / or the addition of atomic impurities or particles to the carrier body material to increase its hardness and strength is / are not required. According to a development, the carrier body is formed from a molybdenum-based alloy whose other alloy constituents (apart from impurities by, for example, oxygen) are at least one element of the group Ti (Ti: titanium), Zr (Zr: zirconium), Hf (Hf: hafnium ) and by at least one element of the group C (C: carbon), N (N: nitrogen) are formed. The oxygen content should always be as low as possible. According to a further development, the carrier body material is formed by a molybdenum alloy designated as TZM, which is specified in the standard ASTM B387-90 for powder metallurgy production. In particular, the TZM alloy has a Ti content (Ti: titanium) of 0.40-0.55 wt%, a Zr content of 0.06-0.12 wt% (Zr: zirconium), a C Content of 0.010-0.040 wt% (C: carbon), an O content of less than 0.03 wt% (O: oxygen), and the remaining content (other than impurities) Mo (Mo: molybdenum) , According to a development, the carrier body material is formed by a molybdenum alloy which has an Hf content of 1.0 to 1.3% by weight (Hf: hafnium), a C content of 0.05-0.12% by weight. , an O content of less than 0.06 wt.% and the remainder (other than impurities) of molybdenum (this alloy is sometimes referred to as MHC). In both compositions oxygen forms an impurity whose content is to be kept as low as possible. The compositions mentioned have proven themselves very well with regard to good heat conduction and handling during production.
According to a further development, the section of the carrier body perpendicular to the focal plane has a preferential texturing of the <111> direction and the <001> direction. According to a further development, the section of the carrier body in directions parallel to the focal plane has a preferential texturing of the <101> direction. The specified preferred texturing will be adjusted accordingly in the forging process, as explained above with respect to the focal path. They are reduced again with increasing degree of recrystallization. From these dependencies results in turn for a person skilled in the art (in accordance with what has been explained above with respect to the focal path) how he has to select the parameters of the powder metallurgy production in the respective composition of the carrier body by the specified preferential texturing in at least one section of the carrier body to obtain. According to a further development, the section of the carrier body perpendicular to the focal plane has a preferred texturing of the &lt; 111 &gt; direction with an X-ray diffraction determinable texture coefficient TC (222) of &gt; 5 and the &lt; 001 &gt; direction with an X-ray diffraction determinable texture coefficient TC (20o) of &gt; 5 on. According to a further development, these texture coefficients TC (222) and TC (20o) are each at least &gt; 4 (the range can be reached directly above this low limit, especially at low degree of deformation). With regard to a high hardness and stability of the carrier body, a low degree of recrystallization and, accordingly, a high degree of preferred texturing is advantageous. Accordingly, according to a further development, the texture coefficients TC (222) and TC (20o) are at least &gt; 5.5.
In the forging process, the force is substantially perpendicular to the focal plane. During the manufacturing process, this direction of the force action is usually substantially parallel to the (future) rotational axis of symmetry of the X-ray rotary anode. If the focal plane is substantially planar, this symmetry is maintained. If, on the other hand, the focal plane is not plane, but, for example, frustoconical (cf., for example, FIG. 3), the outer, circumferential section is usually formed after or in the context of the forging process bent by a desired angle (eg in the range of 8 ° -12 °). The set during forging texture of the focal path and the carrier body is retained. Accordingly, with respect to the texture of the carrier body further reference is made to the focal plane (or to the interface between the focal path and carrier body). Due to the described change in shape in the case of an angled focal path, the texture of the carrier body may differ slightly in a central region (in a central region, then, instead of the focal plane, a plane perpendicular to the rotational axis of symmetry is decisive).
According to a development, the portion of the carrier body at room temperature has an elongation at break of &gt; 2.5% on. In particular, the portion of the support body at room temperature has an elongation at break of &gt; 5% up. In the case of elongation at break, it must again be taken into consideration that with increasing degree of recrystallization of the carrier body, its ductility and thus its elongation at break at room temperature increases. Because of this dependency, the person skilled in the art can accordingly select the parameters of powder metallurgy production (in particular the duration and temperature of the heat treatment (s)), so that the respective value ranges of the elongation at break are achieved. The measurement method associated with the elongation at break is to be carried out in accordance with DIN EN ISO 6892-1, wherein in each case a sample extending radially in the carrier body is used as the measuring sample. In particular, method B, which is based on the voltage velocity and described in DIN EN ISO 6892-1, should be used.
The present invention further relates to a use of an inventive X-ray rotary anode, which may optionally be formed according to one or more of the above-explained developments and / or variants, in an X-ray tube for generating X-radiation.
The present invention further relates to a method for producing an inventive X-ray rotary anode, which is optionally formed according to one or more of the developments and / or variants described above, wherein the method comprises the following steps: A) providing a by pressing and Sintering corresponding starting powders in the composite produced starting body with a carrier body portion of molybdenum or a molybdenum-based mixture and formed on the carrier body portion focal length section of tungsten or a tungsten-based mixture; B) forging the body; and C) performing a heat treatment of the body at and / or after the step of
forging; Wherein the heat treatment is carried out at such low temperatures and for such a period of time that, in the finally heat-treated X-ray rotary anode, at least a portion of the focal path obtained from the focal section is in a non-recrystallized and / or partially recrystallized structure. The pressing and sintering is carried out in such a way that a dense and homogeneous sintered body (hereinafter: body) is obtained (as is known in the art). In particular, the sintered compact has a relative density of &gt; 94% (based on the theoretical density). The above-explained, inventive X-ray rotary anode is obtainable in particular by the specified production method. The method can also have additional steps. In particular, it can be provided that the steps of forging and heat treatment are passed through several times in succession. The last heat treatment can be carried out in particular in a vacuum. According to a further development, it is provided that the forging is carried out at elevated temperatures in order to lower the deformation resistance of the material sufficiently, and that after the forging process additionally a heat treatment (stress relief annealing) is applied ) is carried out.
According to a development, the heat treatment (during forging and / or during a forging process subsequent heat treatment) takes place at temperatures below the recrystallization temperature of the focal path, in particular at temperatures in the region of the recrystallization threshold of the focal path. According to a development, the heat treatment (during forging and / or during a forging process subsequent heat treatment) takes place at temperatures below the recrystallization temperature of the carrier body, in particular at temperatures in the region of the recrystallization threshold of the carrier body. The recrystallization temperature depends inter alia on the particular (material) composition and on the degree of deformation of the respective material. The higher the degree of deformation, the lower the recrystallization temperature. Depending on the shape of the X-ray rotary anode, regions of different degrees of deformation may also exist. According to a development, the heat treatment at temperatures &lt; 1,500 O, in particular carried out at temperatures in a range of 1,300 - 1,500 ° C. These temperatures are particularly suitable for a carrier body made of TZM or from the above specified, concrete composition of Mo, Hf, C and O, in order to achieve the desired properties both in the focal path and in the carrier body. The duration of a heat treatment carried out after the forging process is in particular a few hours, e.g. in the range of 1-5 hours.
According to a development, the forged body after completion of the forging a degree of deformation of at least 20%, in particular in the range of 20% to 60%. However, it is also possible to achieve degrees of deformation of up to 80%. Forcing is particularly parallel to the rotational axis of symmetry of the X-ray rotary anode, which is aligned exactly or essentially perpendicular to the focal plane (s). In this case, the ratio of the change in height of the respective body, which is achieved parallel to the direction of the force of action, relative to its starting height (along the direction of the force of action) is referred to as degree of deformation.
Further advantages and advantages of the invention will become apparent from the following description of embodiments with reference to the accompanying figures. In the figures: Fig. 1A-1C; Fig. 2: Fig. 3: Figs. 4A-4D: Figs. 5A-5C: Figs 6: [0053] FIG. 7: schematic representations for illustrating different degrees of recrystallization; a schematic diagram illustrating the hardness profile as a function of the temperature of a heat treatment; a schematic cross-sectional view of an X-ray rotary anode; a schematic representation illustrating an EBSD analysis; inverse pole pieces of the focal path of an inventive X-ray rotary anode along different directions; inverse pole figure of a focal path, which was applied by CVD; and inverse pole figure of a deposited by vacuum plasma spraying focal path.
The following explanation of Figures 1A-1C and 2 shows criteria by means of which a non-recrystallized structure, a partially recrystallized structure and a (fully) recrystallized structure can be distinguished from one another. Furthermore, with reference to these figures, parameters are explained by means of which the degree of recrystallization can be stated. These explanations apply both in relation to the focal track and in relation to the carrier body. In FIGS. 1A-1C, schematically (greatly enlarged) structures are shown, as shown, for example, in an electron micrograph of a suitably prepared ground surface, in particular within the framework of an EBSD analysis (EBSD: Electron Backbone AT12 494U9 2012-). 09-15 scatter diffraction) are representable. A suitable method for sample preparation, a suitable measuring arrangement and a suitable measuring method will be explained with reference to FIGS. 4A to 4D. As is known in the art, the grain boundaries (and optionally also the small angle grain boundaries) and the dislocations in such an electron micrograph can be visualized. For this purpose, a minimum rotation angle is specified, from which point a grain boundary is drawn. In FIGS. 1A to 1C (apart from the detail shown separately in FIG. 1B) it is assumed that a minimum angle of rotation of 15 ° has been indicated, so that the course of the large-angle grain boundaries (or grain boundary sections) can be seen. In Fig. 2, starting from an initial hardness -AH-, which is obtained in the context of powder metallurgy production after the forging process (initial hardness -AH- the forming structure), schematically the dependence of the hardness of the temperature -T- a subsequent heat treatment (Stress relief annealing), which is performed over a predetermined period of time -t-, such as over a period of one hour, shown. If the heat treatment is carried out for a longer, predetermined period of time, the stage shown in FIG. 2 shifts to the left (ie to lower temperatures), whereas it shifts to the right (ie to higher temperatures) for a shorter period of time ,
In Fig. 1A is a pure forming structure, as obtained for example after a forging process (which is carried out in the context of powder metallurgical production) is shown. As is known in the art, such a reforming structure does not have clear grain boundaries around corresponding crystal grains. Rather, only grain boundary sections -2- can be seen, each having an open beginning and / or an open end. In some cases (depending on the degree of deformation during the forging process), sections of the grain boundaries of the original grains of the sintered product can also be identified. Further, as a result of forming (forging), dislocations -4- shown by the symbol in Figs. 1A and 1B and new grain boundary portions -2- are formed. The original grains of the seedling, if still recognizable, are severely squeezed and distorted due to reshaping. Furthermore, the forming structure has a substructure that can be made visible in the context of an EBSD analysis of the respective ground surface when setting a smaller minimum rotation angle. This substructure of the forming structure will be explained below with reference to FIG. 1B. With increasing degree of deformation, the original grain boundaries (the grains of the sintered product) disappear in sections or even completely. The intensity and frequency of these typical features of the forming structure depends, inter alia, on the (material) composition and the degree of deformation. In particular, it should be noted that with increasing degree of deformation small angle grain boundary sections increasingly occur and also the frequency of large angle grain boundary sections increases. A determination of the average grain size, which regularly takes place in the case of uniform structures according to the standard ASTM E 112-96, is not possible because (at least at a minimum angle of rotation of 15 °) only grain boundary sections are recognizable.
Recovery processes usually take place in the forming structure, which increase with increasing temperature. For such recovery processes, which can be seen, for example, in the disappearance and / or ordering of dislocations, no activation energy is required. These recovery processes lead to a decrease in hardness. In this region -EH- of the recovery processes (range up to Ti in Fig. 2), the hardness decreases continuously with increasing temperature, the slope in this range -EH- is relatively flat (see Fig. 2). Above a certain temperature -Ti, the activation energy required for grain regeneration during recrystallization can be applied. This temperature depends, among other things, on the composition and the degree of deformation of the forming structure as well as on the duration of the heat treatment carried out in each case. If a recrystallization occurs, then there is (initially) a partially recrystallized structure. Fig. 1B shows a partially recrystallized structure having some grain grains formed by grain remodeling -6. The crystal grains (or crystallites) -6- each have circumferential grain boundaries, for example, in an electron micrograph of a suitably prepared ground surface, in particular in the context of an EBSD analysis (FIG. EBSD: Electron Backscatter Diffraction). The remaining (or the crystal grains -6- surrounding) proportion of partially recrystallized structure is still present in the forming structure. Due to the grain regeneration as well as partly due to recovery processes, the dislocations occurring in the forming structure increasingly disappear.
As already mentioned, another feature of the forming structure is that it has a substructure. Such a substructure can be visualized in an EBSD analysis by specifying a smaller minimum rotation angle, such as by a minimum rotation angle of 5 ° (or possibly even an even smaller angle). In this way, in addition to the large-angle grain boundaries (grain boundary sections -2- and circumferential grain boundaries -8-) also the small-angle grain boundaries -9-, which form the substructure, recognizable. This is illustrated in Fig. 1B in the lower box, in which a section of the structure shown in the box above is shown enlarged. The small-angle grain boundaries -9- of the substructure are shown in thinner lines in this illustration. As can be seen from this illustration, the large-angle grain boundaries of the grain boundary sections -2- are still partly continued by small-angle grain boundaries -9-. The crystal grains -6- produced by grain regeneration are free of the structure. In the case of the inventive X-ray rotary anode, the substructure -9- of the forming structure is, in particular, of fine-grained design.
With increasing recrystallization, which increases with the temperature (and time) of the heat treatment, the hardness decreases sharply (see Fig. 2). In FIG. 2, starting from the temperature -Tr, the graph, which previously dropped slightly, merges into an area with a steeply sloping gradient. The transition region between the shallow sloping portion and the steeply sloping portion of the graph, in particular the point with the highest curvature, is called the recrystallization threshold -RKS- (see Fig. 2). As the degree of recrystallization increases, the crystal grains that have already formed as a result of new grain formation increase, as a result of the formation of grain new crystal grains are formed and the forming structure disappears increasingly. In particular, the reshaping structure is increasingly "consumed" by the crystal grains produced by grain remodeling. With a further increase in the degree of recrystallization, the grain boundaries of the crystal grains formed by grain formation collide and eventually (at least to a large extent) also fill in the remaining interstices. At this stage, the crystal growth slows down again, and in Fig. 2, the slope of the graph flattens. A state is achieved in which the recrystallization is completed by 99 °, in particular in which the crystal grains formed by grain formation have a surface area of 99% with respect to a cross-sectional area through the structure. The recrystallization temperature, which in Fig. 2 corresponds to -T2- (in Fig. 2, the duration of the heat treatment is one hour), is defined so that after a heat treatment of one hour at this recrystallization temperature, the recrystallization is 99% complete. The range -RK-, which varies from the temperature -Tr to the recrystallization temperature -T2 &quot; is referred to as the recrystallization region, since recrystallization processes occur to a considerable extent within it. Finally, the graph goes into an area -EB-, in which it no longer or only very flat drops. Grain growth still occurs in this region, but there is no recrystallization or only a very small amount of recrystallization (in particular of the remaining one percent of the structure).
In Fig. 1C, an idealized, fully recrystallized structure is shown. The grain boundaries of the crystal grains formed by grain remodeling directly adjoin one another. The original forming structure has completely disappeared. Here, in Fig. 1C, the "ideal case" is shown. a fully recrystallized structure, since the grain boundaries each adjacent to each other along their entire extension direction.
In Fig. 3, the structure of a Röntgendrehanode -10- is shown schematically, which is rotationally symmetrical to a rotational symmetry axis -12- formed. The X-ray rotary apparatus has a plate-shaped carrier body -14-, which can be mounted on a corresponding shaft. On the cover side, on the support body -14- an annular focal path -16- applied, which has a truncated cone shape (of a flat cone) in the illustrated embodiment. The focal track 16 covers at least one region of the carrier body 14 which, in use, is traversed by an electron beam. As a rule, the focal track covers a larger area of the carrier body than that of the path of the electron beam. The outer shape and the structure of the X-ray rotary anode -10- can, as is known in the art, deviate from the illustrated X-ray rotary anode. As can be seen from FIG. 3, the (macroscopic) portion of the non-recrystallized and / or partially recrystallized structure (both in the focal path and in the carrier body) can generally be determined by one, radial (ie by rotation Symmetry axis -12-extending) and perpendicular to the focal plane plane extending cross-sectional area is then examined, which areas are present in a non-recrystallized and / or in a partially recrystallized structure.
In the following, an EBSD analysis (EBSD: Electron Backscatter Diffraction) which can be carried out with a scanning electron microscope is explained with reference to FIGS. 4A to 4D. Within the framework of such an EBSD analysis, a characterization of the respective structure can be carried out on a microscopic level. In particular, within such an EBSD analysis, the fine granularity of the respective structure can be determined, the appearance and extent of substructures can be determined, the proportion of grain grains formed by grain remodeling in a partially recrystallized structure, and preferred texture textures occurring in the structure. For this purpose, in the context of the sample preparation, a cross-sectional area extending radially and perpendicular to the focal plane (corresponding to the cross-sectional area shown in FIG. 3) is produced by the X-ray rotary anode. The preparation of a corresponding ground surface is effected in particular by embedding, grinding, polishing and etching at least a portion of the obtained cross-sectional area of the X-ray rotary anode, the surface subsequently being further ion-polished (for removal of the deformation structure on the surface resulting from the grinding process). In this case, the ground surface to be examined can in particular be chosen such that it has a section of the focal path and a section of the carrier body of the X-ray rotary anode, so that both sections can be examined. The measuring arrangement is such that the electron beam impinges on the prepared ground surface at an angle of 20 °. In the scanning electron microscope (Carl Zeiss "Ultra 55 plus"), the distance between the electron source (field emission cathode) and the sample is 16.2 mm and the distance between the sample and the EBSD camera ("DigiView IV &quot; ) is 16 mm. The details given in parentheses relate to the types of equipment used by the applicant, and in principle also other types of equipment, which allow the described functions, are used in a corresponding manner. The acceleration voltage is 20 kV, a 50-fold magnification is set and the distance of the individual pixels on the sample, which are scanned in succession, is 4 pm.
The individual pixels 17 are arranged relative to one another in equilateral triangles, wherein the side length of a triangle corresponds in each case to the grid spacing -18- of 4 μm (cf., FIG. 4A). The information for a single pixel -17- come from a volume of the respective sample, which has a surface with a diameter of 50 nm (nanometers) and a depth of 50 nm. The representation of the information of a pixel is then in the form of a hexagon -19- (shown in phantom in FIG. 4A), the sides of each of which the bisectors between the respective pixel -17- and the respective nearest (six) pixels -17- form. The investigated sample area -21- is in particular 1,700 pm by 1,700 pm. As shown in FIG. 4B, in the present case, in an upper half, it comprises a focal section -22- (in cross-section) of approximately 850 by 1,700 pm and in the lower half a support body section -24- (in cross section) of approximately 850 times 1,700 pm2. The interface -26- (between the focal track and the carrier body) runs parallel to the focal plane and centrally through the examined sample surface -21- (in each case parallel to the Austrian Patent Office AT12 494 U9 2012-09-15 whose pages) , Further, it is parallel to the radial direction -RD- (see, e.g., direction -RD-in Fig. 3, 4B). As explained above with reference to Fig. 4A, the sample area -21- being examined is scanned at a 4 μm pitch.
For the determination of the average grain boundary distance (or small-angle grain boundary distance) grain boundaries and grain boundary sections with a grain boundary angle greater than or equal to a minimum rotation angle are visualized within the examined sample surface -21- within the scope of the EBSD analysis. In the present case, a minimum angle of rotation of 15 ° in the scanning electron microscope is set to determine the mean grain boundary distance. The investigated section of the X-ray rotary anode has a (total) degree of deformation of 60%. It should be noted that due to the high hardness of the focal point of the (local) degree of deformation of the focal path is lower per se, while the (local) degree of deformation of the carrier body is at least partially higher. In particular, the degree of deformation of the carrier body away from the focal path increases in a direction perpendicular to the focal plane in the downward direction. Accordingly, the result of the investigation depends on the (total) degree of deformation of the examined section as well as on the position of the investigated sample surface -21-. Due to the explained position of the examined sample surface -21- in the region of the interface -26-, both the investigated focal-web section -22- and the investigated carrier body section -24- are spaced less than 1 mm from the interface -26- (this is particularly the case with reference to FIG Carrier body relevant in which, depending on the height, ie in a direction parallel to the rotational axis of symmetry, different degrees of deformation occur). Within the investigated sample surface grain boundaries or grain boundary sections are always determined and displayed between two halftone dots -17- by the scanning electron microscope if an orientation difference of the respective lattices of &gt; 15 ° is determined (is set another minimum rotation angle, the latter is decisive). The orientation difference used is in each case the smallest angle which is required in order to convert the respective crystal lattices which are present at the respective grid points 17 to be compared into one another. This process is performed at each grid point -17- with respect to all grid points surrounding it (i.e., each with respect to six surrounding grid points). In Fig. 4A, a grain boundary portion -20-is exemplified. In this way, within the investigated sample surface -21-, a grain boundary pattern -32- formed in the case of a partially recrystallized structure (at a minimum rotation angle of 15 °) through grain boundary portions and circumferential grain boundaries is obtained. This is shown schematically in FIGS. 4C and 4D for a section of the focal track. If a minimum rotation angle of 5 ° is set, the small-angle grain boundaries of the substructure can additionally be made visible (these are not shown in FIGS. 4C and 4D).
In the following, the determination of the mean grain boundary distance of the focal-web material parallel to the focal plane is explained. In order to determine the grain boundary distance of the material of the track material, in each case only the focal point segment -22- of approximately 850 times 1700 μm of the examined sample surface -21- is evaluated. Incidentally, in the presently explained method, the mean grain boundary distance along the direction -RD-, i. along a focal plane parallel to the focal plane (or to the interface -26- in FIG. 4B) and in a substantially radial direction. For this purpose, within the investigated sample surface -21 - (which has an area of 1,700 x 1,700 pm2) in the grain boundary pattern -32- a family of -34- of 98 lines, each with a length of 1,700 μm and a relative distance of 17.2 μm (1,700 pm / 99). In FIG. 4C, this is shown schematically for a section of the focal path located within the examined focal point section -22-. The Linienschar -34- runs parallel to the examined surface (or cross-sectional area) and the individual lines are each parallel to the direction -RD-. The distances between in each case two, mutually adjacent points of intersection of the respective line with lines of the crown boundary pattern -32-are determined on the individual lines. In those areas where the end of a line does not intersect with a line of grain boundary pattern -32- (i.e., form an open end because it forms the boundary of the examined AT12 494 U9 2012-09-15
Focal length section -22-), the length of the section from the line end to the first intersection is evaluated with a line of the grain boundary pattern -32 as a half crystal grain. The frequency of the different distances determined within the focal section -22- (about 850 x 1700 pm2) is evaluated and then an average of the distances is formed (corresponds to the sum of the detected distances divided by the number of measured distances). The described method for determining the mean grain boundary distance is also called "Intercept Length". designated. The determination of the average grain boundary distance perpendicular to the focal plane, i. along the direction -ND-, takes place within the focal section -22- accordingly. Again, a family of -36- (again 98) lines are placed in the grain boundary pattern -32-. The line set -36-runs parallel to the examined surface (or cross-sectional area) and the individual lines run parallel to the direction -ND-. In Fig. 4D this is again shown schematically for the section -28-. The evaluation of the distances is carried out accordingly, as explained above. In this way, a measure of the fine grain of the structure formed of (large-angle) grain boundaries and (large-angle) grain boundary portions can be given. The mean grain boundary distance parallel to the focal plane is generally greater than the mean grain boundary distance perpendicular to the focal plane. This effect is due to the force applied perpendicular to the focal plane during the forging process. The average grain boundary distance d can then be determined from the average grain boundary distance parallel to the focal plane plane dp and the mean grain boundary distance perpendicular to the focal plane ds, as can be seen by the following equation: d = Jdpxds Determining the mean (small angle) grain boundary distance of the section of the focal track parallel and perpendicular to the focal plane, with a minimum rotation angle of 5 ° are performed. From this, in turn, the average small-angle grain boundary distance can be determined according to the formula given above. By specifying a minimum rotation angle of 5 ", the small angle grain boundaries of the substructure (which is present in the forming structure) are additionally taken into account. In this way, a measure of the fine graininess of the structure formed of (large angle) grain boundaries, (large angle) grain boundary portions and small angle grain boundaries can be given.
The degree of recrystallization can be determined on the microscopic level by determining in a micrograph, as is shown schematically for example in FIGS. 1A-1C, the area fraction of the crystal grains produced by grain remodeling (relative to the total area of the examined section) becomes. This determination can in turn be made with a scanning electron microscope in the context of an EBSD analysis. In this regard, reference is made to the measuring arrangement and sample preparation explained above with reference to FIGS. 4A to 4D and the illustrated measuring method. In particular, an angle of &gt; 15 °, so that the course of the large-angle grain boundaries is apparent. In this way, it is possible in particular to determine the circumferential grain boundaries of the grain grains formed by grain regeneration as well as the (large-angle) grain boundary sections. Furthermore, in addition, the same range may be specified by specifying a minimum rotation angle of &gt; 5 ° (or another small value for the minimum rotation angle) to examine whether the individual crystal grains are grain grains formed by grain remodeling (these have no substructure). Subsequently, the ratio of the area of the crystal grains formed by grain remodeling relative to the entire area under investigation is determined.
Further, the degree of recrystallization can also be estimated from the hardness. This can be done, for example, by subjecting a plurality of identically produced samples each time after the forging process to heat treatments for a predetermined period of time, each with a different temperature (if necessary, or alternatively, the Duration of the heat treatment are varied). A hardness measurement is then carried out on the samples at the same position (within the sample). Thus, essentially the course of the curve shown in FIG. 2 can be traced and it can be determined in which region of the curve the respective sample lies. As explained above, it is preferable to work within the range-TB- around the recrystallization threshold -RKS- (the region -TB- being schematically illustrated in FIG. 2 by the dashed circle around the recrystallization threshold -RKS-).
In the context of the determination of the degree of recrystallization, it is generally to be considered that for certain materials (for example molybdenum and molybdenum alloys) pronounced recovery processes take place. These recovery processes can also lead to germs for a new grain formation, according to some views. If grain nucleation takes place from these germs, this type of grain regeneration is also included within the scope of this description with the term recrystallization. If pronounced recovery processes occur, then the graph in FIG. 2 already falls more sharply in the region of the recovery processes -EH- and the recrystallization threshold can shift to higher temperatures. The graph then proceeds at least in the region -EB-, in which the structure is recrystallized, again corresponding to a material without pronounced recovery processes. In particular, there is qualitatively a deviation, as shown schematically in Fig. 2 by the dashed line. In the case of molybdenum-based alloys, this effect is additionally superimposed by the formation of particles, which can also have an effect on the concrete curve course. Qualitatively, however, the curve is always substantially, as shown in Fig. 2.
The production of an X-ray rotary anode according to an embodiment of the present invention will be explained below. First, the starting powders for the carrier body are mixed and the starting powders for the focal path are mixed. The starting powders for the carrier body are chosen such that for the carrier body (apart from impurities) a composition of 0.5 wt.% Ti, 0.08 wt.% Zirconium, 0.01-0.04 wt.% Carbon, less is obtained as 0.03% by weight of oxygen and the remaining portion of molybdenum (after completion of all the heat treatments carried out in the powder metallurgical production) (ie TZM). Furthermore, the starting powders are chosen such that a composition of 10% by weight of rhenium and 90% by weight of tungsten is obtained for the fuel track (apart from impurities). The starting powders are pressed together with 400 tons (equivalent to 4 * 105 kg) per X-ray rotary anode. Subsequently, the resulting body is sintered at temperatures in the range of 2,000 ° C - 2,300 ° C for 2 to 24 hours. In particular, the starting body (sintering) obtained after sintering has a relative density of 94%. The starting body obtained after sintering is forged at temperatures in the range of 1300 ° C to 1500 ° C (preferably 1300 ° C), the body after the forging step having a degree of deformation in the range of 20-60% (preferably of 60%). After the forging step, a heat treatment of the body is carried out at temperatures in the range of 1300 ° C to 1500 ° C (preferably 1400 ° C) for 2 to 10 hours. Insofar as area indications are made in the context of this exemplary embodiment, good results can be achieved in each case for different combinations within the respective area. While the specified parameters in the pressing step and in the sintering step are less critical for the inventive properties of the focal track (and essentially also for the described advantageous properties of the carrier body), the temperatures in particular during the forging step and in the subsequent heat treatment on the properties of the focal track (in particular on their degree of recrystallization). In particular, particularly good results are obtained at the preferred temperatures at the forging step and at the subsequent heat treatment step (at the 60% preferred degree of deformation).
In the case of X-ray rotary anodes produced according to the exemplary embodiment explained above, a hardness of 450 HV 30 and a hardness of 315 HV 10 were achieved in the case of the focal track become. The hardness measurements are to be carried out at one, extending through the axis of rotation symmetry cross-sectional area. In the case of the support body, a 0.2% proof stress Rp 0i 2 of 650 MPa (mega pascal) and an elongation at break A of 5% could also be obtained at room temperature. In this case, a sample extending radially in the carrier body is to be used as a measurement sample. The measuring method to be used is method B, which is based on the voltage velocity and described in DIN EN ISO 6892-1. By comparison, conventional powders produced by powder metallurgy (with the exception of special alloys and materials reinforced with additional particles) typically achieve hardnesses of at most 220 HV 10 and also lower yield strengths.
Accordingly, these results show that in the inventive X-ray rotary anodes significantly higher hardnesses (the focal path and the support body) and higher Dehngrenzen (at least in the carrier body) are achieved than in conventional powder metallurgy produced X-ray anodes. Furthermore, these investigations show that a sufficient ductilization of the carrier body material can be achieved by a heat treatment following the forging process at temperatures in the region of the recrystallization threshold (of the carrier body material). With such a "gentle" Ductilization (i.e., heat treatment at comparatively low temperatures) is achieved at the same time that the structure of the kerf remains very fine-grained. The achieved ductilization can be recognized in particular on the basis of the values obtained for the elongation at break A at room temperature. For a non-heat treated sample, the elongation at break of the (pressed, sintered and forged) carrier body material is typically &lt; 1 %. By ductilization can be avoided that the X-ray rotary anodes are brittle and fragile.
At X-ray anodes formed according to the invention, the focal point was investigated at the end of its service life. It was found that cracks are deflected along the grain boundaries of the fine-grained structure and thus change the direction of propagation several times. Due to this crack deflection along the fine-grained structure, crack propagation deep into the focal track is avoided. It was also possible to observe a uniformly distributed crack pattern with uniformly formed cracks on the surface of the focal point at the end of its service life. In contrast, at comparative X-ray rotary anodes, in which the focal track was produced by vacuum plasma spraying, the crystals of the track are stalk-shaped and aligned perpendicular to the focal plane. As a result, a crack spreads along the grain boundaries deep into the focal path (and eventually down to the support body).
To investigate the texture of the focal track and the carrier body, an X-ray rotary anode, as explained above with reference to FIGS. 4A to 4D, was prepared as a sample to be examined. The X-ray rotary anode was designed according to the invention. The hearth had (apart from impurities) a composition of 90 wt% tungsten and 10 wt% rhenium, while the support body (apart from impurities) had a composition of 0.5 wt% Ti, 0.08 wt% zirconium , 0.01-0.04 wt.% Carbon, less than 0.03 wt.% Oxygen, and the remainder molybdenum. The measuring arrangement corresponds to the arrangement explained above. In the measuring method, the above explained with reference to Figures 4A to 4D settings were used, if they are applicable to the determination of the texture or make. The inverse pole figures obtained as part of the EBSD analysis of the focal track are shown in FIGS. 5A-5C. In this case, with respect to the focal track, the macroscopic, mutually perpendicular directions -ND-, which is perpendicular to the focal plane in the respective investigated area, -RD-, which runs substantially radially and parallel to the focal plane and TD-, which is tangent and parallel to the focal plane, defined (these directions are shown in Fig. 3 for the sake of illustration). The force involved in the forging process during the manufacturing process 19/25

权利要求:
Claims (17)
[1]


Austrian Patent Office AT12 494 U9 2012-09-15 with the associated X-ray rotary anode was perpendicular to the focal plane (i.e., along the -ND- direction). In Fig. 5A, the inverse pole figure of the focal track is in the direction -ND-, in Fig. 5B the inverse pole figure is in direction -RD- and in Fig. 5C the inverse pole figure is shown in the direction -TD-. With reference to Fig. 5A, the pronounced preferential texturing of the <111> direction and the <001> direction along the direction -ND- can be seen. Further, with reference to Figures 5B and 5C, the (less pronounced) preferential texturing of the &lt; 101 &gt; direction along the directions -RD- and -TD- can be seen. For the texture of the carrier body, which was determined in the outer region of the X-ray rotary anode, corresponding results were achieved. In particular, pronounced preferential texturing of the <111> direction and the <001> direction along the direction -ND- as well as (slightly less) pronounced preferential texturing of the <101> direction along the directions -RD and -TD- measured. For comparison, correspondingly prepared samples of a pure tungsten carbide coating (see Fig. 6) applied by CVD method and a focal lane produced by vacuum plasma spraying (see Fig. 7) were made of a tungsten-rhenium alloy (Tungsten content: 90% by weight, rhenium content: 10% by weight) in terms of texture. In FIG. 6, the inverse pole figure in the direction of -TD- is shown. As can be seen from Fig. 6, the CVD coated focal plane has preferential texturing of the &lt; 111 &gt; direction along the direction -TD-. In Fig. 7, the inverse pole figure in the direction -ND- is shown. As can be seen from Fig. 7, the focal path formed by vacuum plasma spraying has pronounced preferential texturing of the <001> direction along the direction ND-. Claim 1. An X-ray rotary anode which has a carrier body (14) and a focal path (16) formed on the carrier body (14), wherein the carrier body (14) and the focal path (16) are produced powder metallurgically in a composite, the carrier body (14) is formed from molybdenum or a molybdenum-based alloy, and the focal track (16) is formed from tungsten or a tungsten-based alloy, characterized in that in the finally heat-treated X-ray rotary anode (10) at least a portion of the focal track (16) in a not recrystallized and / or present in a partially recrystallized structure.
[2]
An X-ray rotating anode according to claim 1, characterized in that said portion of said focal plane perpendicular (ND) to a focal plane comprises preferential texturing of the <111> direction with an X-ray diffractile texture coefficient TC (222) of &gt; 4 and preferential texturing of the &lt; 001 &gt; direction with an X-ray diffraction determinable texture coefficient TC (2oo) of &gt; 5 has.
[3]
3. X-ray rotary anode according to claim 1 or 2, characterized in that at the portion of the focal track (16) perpendicular (ND) to the focal plane level following relationship of the X-ray diffraction determinable texture coefficients TC (222) and TC (3i0) is satisfied:

[4]
4. X-ray rotary anode according to one of the preceding claims, characterized in that the portion of the focal track (16) has a hardness of &gt; 350 HV 30 has.
[5]
5. X-ray rotary anode according to one of the preceding claims, characterized in that the section of the focal track (16) is present in a partially recrystallized structure. 20/25 Austrian Patent Office AT12 494U9 2012-09-15
[6]
6. X-ray rotary anode according to claim 5, characterized in that in the teilrekris-tallisierten structure by Kornneubildung resulting crystal grains (6) are surrounded by a forming structure and that with respect to a cross-sectional area through the partially-recrystallized structure, these crystal grains (6) an area ratio in Range from 10% to 80%.
[7]
7. An X-ray rotating anode according to one of the preceding claims, characterized in that the portion of the focal track (16) has a mean small-angle grain boundary distance of &lt; 10 μm, the mean small-angle grain boundary distance being determinable by a measuring method in which grain boundaries (8), grain boundary sections (2) are formed at a radial cross-sectional area perpendicular to the focal plane in a region of the section of the focal path (16). and small-angle grain boundaries (9) having a grain boundary angle of &gt; 5 °, to determine the average small-angle grain boundary distance parallel to the focal plane in the resulting grain boundary pattern (32), a parallel to the cross-sectional area extending line (34) from each parallel to the focal plane extending lines , which in each case have a distance of 17.2 μm, is laid out on the individual lines, the distances between in each case two mutually adjacent intersection points of the respective line with lines of the grain boundary pattern (32) being determined and the average of these distances as mean Small angle grain boundary distance is determined parallel to the focal plane, for determining the average small-angle grain boundary distance perpendicular to the focal plane in the resulting grain boundary pattern (32), a line parallel to the cross-sectional area extending line (36) from each perpendicular to the focal path Plane extending lines, each one to Ab stand each of 17.2 pm, is placed on each line, the distances between each two mutually adjacent intersection points of the respective line with lines of the grain boundary pattern (32) are determined and the average of these distances as a mean small-angle grain boundary distance perpendicular to the focal plane plane is determined, and the mean small angle grain boundary distance is determined as the geometric mean of the mean small angle grain boundary distance parallel to the focal plane and the mean small angle grain boundary distance perpendicular to the focal plane.
[8]
An X-ray rotating anode according to any one of the preceding claims, characterized in that the portion of the focal path (16) in directions parallel to the focal plane (RD, TD) has preferential texturing of the &lt; 101 &gt; direction.
[9]
9. X-ray rotary anode according to one of the preceding claims, characterized in that at least a portion of the carrier body (14) is present in a non-recrystallized and / or in a partially recrystallized structure.
[10]
10. X-ray rotary anode according to claim 9, characterized in that the portion of the carrier body (14) has a hardness of &gt; 230 HV 10 has.
[11]
The X-ray rotary anode according to claim 9 or 10, characterized in that the portion of the support body (14) perpendicular (ND) to the focal plane has a preferential texturing of the <111> direction and the <001> direction ; and / or - that the portion of the carrier body (14) in directions (RD, TD) parallel to the focal plane has a preferential texturing of the &lt; 101 &gt; direction.
[12]
12. X-ray rotary anode according to one of claims 9 to 11, characterized in that the portion of the carrier body (14) at room temperature an elongation at break of &gt; 2.5%. 21/25 Austrian Patent Office AT12 494 U9 2012-09-15
[13]
13. X-ray rotary anode according to one of the preceding claims, characterized in that the carrier body (14) is formed from a molybdenum-based alloy whose further alloying constituents are defined by at least one element of the group Ti, Zr, Hf and by at least one element of the group C, N are formed.
[14]
14. Use of an X-ray rotary anode (10) according to one of the preceding claims in an X-ray tube for generating X-radiation.
[15]
15. A method for producing an X-ray rotary anode (10) according to any one of claims 1 to 13, comprising the following steps: A) providing an output body produced by pressing and sintering of corresponding starting powders in composite with a carrier body portion of molybdenum or a molybdenum -based mixture and a tungsten or tungsten-based fuel track section formed on the carrier body section; B) forging the body; and C) performing a heat treatment of the body at and / or after the forging step; wherein the heat treatment is carried out at such low temperatures and for such a period of time that in the finally heat-treated X-ray rotary anode (10) at least a portion of the focal path (16) obtained from the focal section is in a non-recrystallized and / or partially recrystallized Structure exists.
[16]
16. The method according to claim 15, characterized in that the heat treatment at temperatures in a range of 1,300 - 1,500 ° C is performed.
[17]
17. The method according to claim 15 or 16, characterized in that the forged body after completion of the forging has a degree of deformation in the range of 20% to 60%. 3 sheets of drawings 22/25

类似技术:

---

公开号 | 公开日 | 专利标题

---

AT12494U9|2012-09-15|X ROTARY ANODE

---

EP2193867B1|2012-06-20|Wire electrodes for electrical discharge cutting and method for manufacturing such a wire electrode.

---

DE2927079C2|1992-04-30|

---

EP1447656A1|2004-08-18|Specimens for transmission electron microscope

---

WO2012028613A1|2012-03-08|Substrate for mirrors for euv lithography

---

DE102013103896A1|2014-10-23|A method of manufacturing a thermoelectric article for a thermoelectric conversion device

---

DE102014114830A1|2016-04-28|A method of making a thermoelectric article for a thermoelectric conversion device

---

AT16217U1|2019-03-15|Additive manufactured component

---

AT501142B1|2007-01-15|X-RAY TUBES WITH A ROSET AGENT COMPOSITE AND A METHOD FOR THE PRODUCTION THEREOF

---

AT13602U2|2014-04-15|Sputtering target and method of preparation

---

DE1558632A1|1970-04-23|Corrosion-resistant cobalt-nickel-molybdenum-chromium alloys

---

EP3688200A1|2020-08-05|Sintered molybdenum part

---

EP3883711A1|2021-09-29|Additively-manufactured refractory metal component, additive manufacturing process, and powder

---

DE112016003045T5|2018-04-19|Casting material and method for producing a casting material

---

EP3172354B1|2018-04-25|Silver-alloy based sputtering target

---

AT15356U1|2017-07-15|Sputtering target

---

JP6815574B1|2021-01-20|Tungsten carbide powder

---

DE102018113340A1|2019-12-05|Density optimized molybdenum alloy

---

EP3168325B1|2022-01-05|Silver alloy based sputter target

---

DE102015218408A1|2017-03-30|Component and / or surface of a refractory metal or a refractory metal alloy for thermocyclic loads and manufacturing method thereto

---

WO2015087252A1|2015-06-18|Helical spring for mechanical timepieces

---

DE112017001794T5|2018-12-13|Silicon nitride based sintered body and cutting insert

---

Glatz et al.0|19, United States i, Patent Application Publication to, Pub. No.: US 2013/0308758A1

---

DE102007038581A1|2009-02-19|Valve metal structure and valve metal sub-oxide structure, have lateral dimension of 5 to 10 nanometers and are expanded in streaky or flat manner and valve metal structures are in form of foils or wires

同族专利:

---

公开号 | 公开日

---

US20160254115A1|2016-09-01|

---

JP2014506711A|2014-03-17|

---

KR101788907B1|2017-10-20|

---

CN103329239A|2013-09-25|

---

JP5984846B2|2016-09-06|

---

EP3109889A1|2016-12-28|

---

WO2012097393A1|2012-07-26|

---

AT12494U9|2012-09-15|

---

EP3109889B1|2018-05-16|

---

US20130308758A1|2013-11-21|

---

EP2666180B1|2016-11-30|

---

KR20140020850A|2014-02-19|

---

EP2666180A1|2013-11-27|

---

US9767983B2|2017-09-19|

---

ES2613816T3|2017-05-26|

---

CN103329239B|2016-10-12|

---

US9368318B2|2016-06-14|

引用文献:

---

公开号 | 申请日 | 公开日 | 申请人 | 专利标题

---

EP0266157A1|1986-10-27|1988-05-04|Kabushiki Kaisha Toshiba|X-ray tube|

---

RU2168235C1|2000-04-04|2001-05-27|Государственный научно-исследовательский институт Научно-производственного объединения "Луч"|X-ray tube anode manufacturing process|

---

US20020168051A1|2001-05-14|2002-11-14|Varian Medical Systems, Inc|Method for manufacturing x-ray tubes|

---

BE758645A|1969-11-08|1971-05-06|Philips Nv|PROCESS FOR THE MANUFACTURE OF ROTARY ANODES FOR TUBESA RAYONSX|

---

US4109058A|1976-05-03|1978-08-22|General Electric Company|X-ray tube anode with alloyed surface and method of making the same|

---

JPS6157716B2|1977-07-06|1986-12-08|Nippon Electric Co|

---

JP2845459B2|1988-10-17|1999-01-13|株式会社東芝|Anode for X-ray tube and method for producing the same|

---

AT188312T|1994-03-28|2000-01-15|Hitachi Ltd|X-RAY TUBE AND ANODENTARGET THEREFOR|

---

JP3052240B2|1998-02-27|2000-06-12|東京タングステン株式会社|Rotating anode for X-ray tube and method for producing the same|

---

US6707883B1|2003-05-05|2004-03-16|Ge Medical Systems Global Technology Company, Llc|X-ray tube targets made with high-strength oxide-dispersion strengthened molybdenum alloy|

---

US7255757B2|2003-12-22|2007-08-14|General Electric Company|Nano particle-reinforced Mo alloys for x-ray targets and method to make|

---

CN101326297B|2005-10-27|2014-06-11|株式会社东芝|Molybdenum alloy, and making use of the same, X-ray tube rotating anode target, X-ray tube and melting crucible|

---

US8553844B2|2007-08-16|2013-10-08|Koninklijke Philips N.V.|Hybrid design of an anode disk structure for high prower X-ray tube configurations of the rotary-anode type|DE102013219123A1|2013-09-24|2015-03-26|Siemens Aktiengesellschaft|Rotating anode arrangement|

---

US9992917B2|2014-03-10|2018-06-05|Vulcan GMS|3-D printing method for producing tungsten-based shielding parts|

---

CN104062311B|2014-05-23|2017-01-18|武汉钢铁公司|Method for measuring inverse pole figure by inclining and rotating test sample|

---

DE102014210216A1|2014-05-28|2015-12-03|Siemens Aktiengesellschaft|Method for producing a component|

---

CN106531599B|2016-10-28|2018-04-17|安泰天龙钨钼科技有限公司|A kind of X-ray tube W-Re molybdenum alloy rotary anode target and preparation method thereof|

---

KR101902010B1|2016-12-09|2018-10-18|경북대학교 산학협력단|Target of X-ray tube, X-ray tube with the same, and method for fabricating the X-ray target|

---

KR102236293B1|2019-03-27|2021-04-05|주식회사 동남케이티씨|Method for manufacturing rotating anode target of X-ray tube and Rotating anode target|

---

US11043352B1|2019-12-20|2021-06-22|Varex Imaging Corporation|Aligned grain structure targets, systems, and methods of forming|

法律状态:
2018-09-15| MM01| Lapse because of not paying annual fees|Effective date: 20180131 |

优先权:

---

申请号 | 申请日 | 专利标题

---

ATGM34/2011U|AT12494U9|2011-01-19|2011-01-19|X ROTARY ANODE|ATGM34/2011U| AT12494U9|2011-01-19|2011-01-19|X ROTARY ANODE|

---

US13/980,585| US9368318B2|2011-01-19|2012-01-17|Rotary X-ray anode|

---

CN201280005994.5A| CN103329239B|2011-01-19|2012-01-17|Rotary X-ray anode|

---

EP16001702.6A| EP3109889B1|2011-01-19|2012-01-17|Rotating anode|

---

EP12709493.6A| EP2666180B1|2011-01-19|2012-01-17|Rotary x-ray anode|

---

KR1020137018946A| KR101788907B1|2011-01-19|2012-01-17|Rotary x-ray anode|

---

PCT/AT2012/000009| WO2012097393A1|2011-01-19|2012-01-17|Rotary x-ray anode|

---

ES12709493.6T| ES2613816T3|2011-01-19|2012-01-17|Rotating X-ray anode|

---

JP2013549673A| JP5984846B2|2011-01-19|2012-01-17|X-ray rotating anode|

---

US15/133,480| US9767983B2|2011-01-19|2016-04-20|Rotary X-ray anode and production method|